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MPC7457 Arkusz danych(PDF) 64 Page - Freescale Semiconductor, Inc |
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MPC7457 Arkusz danych(HTML) 64 Page - Freescale Semiconductor, Inc |
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64 / 71 page ![]() MPC7457 RISC Microprocessor Hardware Specifications, Rev. 8 System Design Information Freescale Semiconductor 64 example, assuming a Ta of 30°C, a Tr of 5°C, a CBGA package RθJC = 0.1, and a typical power consumption (Pd) of 18.7 W, the following expression for Tj is obtained: Die-junction temperature: Tj = 30°C + 5°C + (0.1°C/W + 1.5°C/W + θsa) × 18.7 W For this example, a Rθsavalue of 2.1°C/W or less is required to maintain the die junction temperature below the maximum value of Table 4. Though the die junction-to-ambient and the heat sink-to-ambient thermal resistances are a common figure-of-merit used for comparing the thermal performance of various microelectronic packaging technologies, one should exercise caution when only using this metric in determining thermal management because no single parameter can adequately describe three-dimensional heat flow. The final die-junction operating temperature is not only a function of the component-level thermal resistance, but the system-level design and its operating conditions. In addition to the component's power consumption, a number of factors affect the final operating die-junction temperature—airflow, board population (local heat flux of adjacent components), heat sink efficiency, heat sink attach, heat sink placement, next-level interconnect technology, system air temperature rise, altitude, etc. Due to the complexity and the many variations of system-level boundary conditions for today's microelectronic equipment, the combined effects of the heat transfer mechanisms (radiation, convection, and conduction) may vary widely. For these reasons, we recommend using conjugate heat transfer models for the board, as well as system-level designs. For system thermal modeling, the MPC7447 and MPC7457 thermal model is shown in Figure 30. Four volumes will be used to represent this device. Two of the volumes, solder ball, and air and substrate, are modeled using the package outline size of the package. The other two, die, and bump and underfill, have the same size as the die. The silicon die should be modeled 9.64 × 11.0 × 0.74 mm with the heat source applied as a uniform source at the bottom of the volume. The bump and underfill layer is modeled as 9.64 × 11.0 × 0.069 mm (or as a collapsed volume) with orthotropic material properties: 0.6 W/(m • K) in the xy-plane and 2 W/(m • K) in the direction of the z-axis. The substrate volume is 25 × 25 × 1.2 mm (MPC7447) or 29 × 29 × 1.2 mm (MPC7457), and this volume has 18 W/(m • K) isotropic conductivity. The solder ball and air layer is modeled with the same horizontal dimensions as the substrate and is 0.9 mm thick. It can also be modeled as a collapsed volume using orthotropic material properties: 0.034 W/(m • K) in the xy-plane direction and 3.8 W/(m • K) in the direction of the z-axis. |
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